After the challenges of the winter ice storm in Nashville, it is wonderful to be welcoming Spring. VINSE is also welcoming a new faculty member to our community, Assistant Professor Asheley Chapman. The Chapman Lab, located in ESB, will contribute to the Nano-Bio/Medicine research thrust and explore the intersection of nanotechnology, immunology, and translational medicine.
Mark your calendars for the VINSE Community Picnic on April 4th, an event not to be missed! Also not to be missed are our VINSE short courses this summer – register for one (or more!) as a great way to enhance your skills and knowledge base. What will be missed are the tremendous efforts of the graduating members of our VINSE undergraduate Tech Crew – see their stories linked below in the newsletter.
Stay tuned for updates on our new electron beam lithography tool installation and renovations in the cleanroom Bio Bay for ancient DNA research in our next newsletter.
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VINSE Welcomes Asheley Chapman
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VINSE welcomes Asheley Chapman, Assistant Professor in the Department of Chemical and Biomolecular Engineering. The Chapman Lab will focus on the design of targeted vaccines and therapeutics for infectious diseases and autoimmune disorders, with particular emphasis on modulating B cell responses and understanding germinal center biology.
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Celebrating the Achievements of VINSE’s Graduating Tech Crew Members
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VINSE celebrates the achievements of five outstanding Tech Crew members from the Class of 2026 - Ella Dzialowski, Carson Felton, Parker Friedli, Jenna Jang, and Rafael Rodas. Their contributions to cleanroom operations, research, and outreach have been integral to VINSE’s success.
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VINSE Researcher Highlights
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Food, Games & Fun! Have You RSVP?
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We’re excited to invite you to the VINSE Community Picnic! Join us for a day filled with food, games, laughter, and time together outside the lab. Come ready to relax, connect, and celebrate our amazing VINSE community. We can’t wait to see you there on April 4th!
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VINSE Technical Highlights
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Ion Wave 10 Batch Plasma System has returned to the VINSE cleanroom, providing high-density, low-bias microwave plasma processing for resist removal, surface preparation, and device analysis.
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Buehler EcoMet 30 supports both manual and automated polishing, offering precise control of speed, direction, force, and abrasive grit for rapid, controlled material removal.
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Transition from L-Edit to KLayout for Cleanroom CAD customized photolithography patterning for direct-write or photomask applications.
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